Chemical Vapor Deposition of ZrO2 Thin Films Using Zr(NEt2)4 as Precursor

B\ uslng tetralus(&etli\lan~~do) t ~ r c o n ~ u ~ i l IZr(NEtZ)41 c\cellent qua115 ZrO? t h ~ n filnis ucrc depos~ted \ \ ~ t h hldi gro\\tli ratcs on alunl~na and glass substrates b? cl~enucal \spar dcpos~t~on Thc depos~l~om ncre carned out In a hot nall reactor at rcduccd prcssurc (2UO Pa) In the temperature rangc 50058U°C and In tlic prescncc of ongcn Thc as-groltn filriis arc colourlcss snlooth and ncll-adherent to the substraies S N S anal\s~s c!~dc~iccd purc ZrO. nlth a slight superficl~l contiinunatlon of h\drocarbons and nltrogen Thc fil~ils ha\c a tapcrcd pol\cnstalllnc columnar structure ell \ ~ s ~ b l c In SEM mlcrograpl~s From X-ra\ &ffract~on anal~sls thc monocl~nlc phasc rcsultcd as thc niajor phase together \\lth a small \anable amount of tctragondl /lrconla Undcr 5iOoC the as-gronn filnls rcsultcd lughl\ tc\turcd and \\ere dom~natcd b\ tlic (020) onentatloll Thc films ncre annealed In thc r a n g 600-1OOO"C and thc cffcct of annealing on thc tc\iurc and on the pl~asc and &mc~is~ons of the cnstall~tes ha\c been sludlcd